INTERNATIONAL PATENT: IDEMITSU KOSAN CO.,LTD., 出光興産株式会社 FILES APPLICATION FOR "RESIN, ELECTRONIC SUBSTRATE MATERIAL, COATING LIQUID COMPOSITION, FILM, SHEET, ELECTRONIC SUBSTRATE AND RESIN PRODUCTION METHOD"

GENEVA, July 3 -- IDEMITSU KOSAN CO.,LTD. (2-1, Otemachi 1-chome, Chiyoda-ku, Tokyo1008321), 出光興産株式会社 (東京都千代&... Read More

INTERNATIONAL PATENT: SHIN-ETSU CHEMICAL CO., LTD., 信越化学工業株式会社 FILES APPLICATION FOR "ORGANOPOLYSILOXANE COMPOUND AND PHOTOCURABLE RESIN COMPOSITION CONTAINING SAME"

GENEVA, July 3 -- SHIN-ETSU CHEMICAL CO., LTD. (4-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1000005), 信越化学工業株式会社 (東京&#... Read More

INTERNATIONAL PATENT: MITSUI CHEMICALS, INC., 三井化学株式会社 FILES APPLICATION FOR "METHOD FOR MANAGING CARBON NANOTUBE PELLICLE MEMBRANE, DEVICE FOR MANAGING CARBON NANOTUBE PELLICLE MEMBRANE AND PELLICLE CASE"

GENEVA, July 3 -- MITSUI CHEMICALS, INC. (2-1, Yaesu 2-chome, Chuo-ku, Tokyo1040028), 三井化学株式会社 (東京都中央区... Read More

INTERNATIONAL PATENT: SUMITOMO CHEMICAL COMPANY, LIMITED, 住友化学株式会社 FILES APPLICATION FOR "METHOD FOR PRODUCING CARBON AND HYDROGEN AND CARBON FIBER"

GENEVA, July 3 -- SUMITOMO CHEMICAL COMPANY, LIMITED (2-7-1, Nihonbashi, Chuo-ku, Tokyo1036020), 住友化学株式会社 (東京都中&#228... Read More

INTERNATIONAL PATENT: ONO PHARMACEUTICAL CO., LTD., 小野薬品工業株式会社, MARUHA NICHIRO CORPORATION, マルハニチロ株式会社 FILES APPLICATION FOR "COMPOSITION FOR IMPROVING EYE DISORDER"

GENEVA, July 3 -- ONO PHARMACEUTICAL CO., LTD. (1-5, Doshomachi 2-chome, Chuo-ku, Osaka-shi, Osaka5418526), 小野薬品工業株式会社 (大&#... Read More

INTERNATIONAL PATENT: MITSUBISHI CHEMICAL CORPORATION, 三菱ケミカル株式会社 FILES APPLICATION FOR "COMPOSITION, HOLE TRANSPORT LAYER, PHOTOELECTRIC CONVERSION ELEMENT AND METHOD FOR MANUFACTURING SAME"

GENEVA, July 3 -- MITSUBISHI CHEMICAL CORPORATION (1-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008251), 三菱ケミカル株式会社 (東&#20140... Read More

INTERNATIONAL PATENT: MITSUBISHI GAS CHEMICAL COMPANY, INC., 三菱瓦斯化学株式会社 FILES APPLICATION FOR "CLEANING SOLUTION FOR SIMULTANEOUSLY REMOVING PHOTORESIST RESIDUE AND ETCH STOP LAYER AND METHOD FOR MANUFACTURING SEMICONDUCTOR CIRCUIT ELEMENT USING SAME"

GENEVA, July 3 -- MITSUBISHI GAS CHEMICAL COMPANY, INC. (5-2, Marunouchi 2-chome, Chiyoda-ku, Tokyo1008324), 三菱瓦斯化学株式会社 (東&... Read More

INTERNATIONAL PATENT: MEIDENSHA CORPORATION, 株式会社明電舎 FILES APPLICATION FOR "VACUUM INTERRUPTER AND METHOD FOR MANUFACTURING VACUUM INTERRUPTER"

GENEVA, July 3 -- MEIDENSHA CORPORATION (1-1, Osaki 2-chome, Shinagawa-ku, Tokyo1416029), 株式会社明電舎 (東京都品川区&#22... Read More

INTERNATIONAL PATENT: INSTITUTE OF SCIENCE TOKYO, 国立大学法人東京科学大学, OSAKA UNIVERSITY, 国立大学法人大阪大学 FILES APPLICATION FOR "METHANE PRODUCTION METHOD AND METHANE PRODUCTION DEVICE"

GENEVA, July 3 -- INSTITUTE OF SCIENCE TOKYO (2-12-1, Ookayama, Meguro-ku, Tokyo1528550), 国立大学法人東京科学大学 (東&#20... Read More

INTERNATIONAL PATENT: HITACHI, LTD., 株式会社日立製作所 FILES APPLICATION FOR "BATTERY SYSTEM OPERATION DEVICE, BATTERY SYSTEM OPERATION METHOD AND PROGRAM"

GENEVA, July 3 -- HITACHI, LTD. (6-6, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008280), 株式会社日立製作所 (東京都千代&... Read More

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