India, Sept. 10 -- Silicon Austria Labs (SAL) has received its Centura PECVD tool from Applied Materials, supporting dielectrics deposition for RF circulators on 200mm wafers. The tool is in commissioning phase and targets the end of 2025 for full qualification.

In support of the FAMES Pilot Line, Silicon Austria Labs (SAL) is expanding its capabilities in semiconductor process development and is also developing RF circulators on 200 mm wafers. The Plasma Enhanced Chemical Vapor Deposition (PECVD) system from Applied Materials enables dielectrics deposition on 200mm wafers.

This addition is vital for the development of advanced materials and processes, particularly for the fabrication of RF circulators within the FAMES pilot line, to su...