India, Nov. 19 -- Nearfield Instruments, the leader in 3D, non-destructive, in-line process control solutions based on scanning probe technology, has announced a strategic development project to accelerate innovation in semiconductor metrology.

As part of a multi-year collaboration, Nearfield Instruments will deploy its flagship system, QUADRA, at imec's advanced R&D facility in Leuven. The two organizations will jointly develop next-generation metrology solutions to address critical challenges across the semiconductor manufacturing value chain, including:

High-NA EUV Lithography Metrology

* Development and characterization of high-NA EUV resist 3D metrology using Nearfield's proprietary High-Aspect-Ratio (HAR) imaging mode (FFTP) to i...