India, Dec. 1 -- Beneq, a global leader in Atomic Layer Deposition (ALD) equipment and solutions, announced Beneq Transmute, a next-generation ALD platform designed for high-volume semiconductor manufacturing.

Engineered for high volume production of Wide Bandgap (WBG) power electronics, advanced RF devices, and μLED and other specialty devices, Beneq Transmute combines performance, scalability, and cost efficiency in one system.

Atomic precision at manufacturing speed

Beneq Transmute extends the performance of the Beneq Transform XP platform into production environments with Beneq's proprietary three-step ALD architecture. By combining plasma pre-treatment, plasma-enhanced ALD (PEALD), and thermal batch ALD, the platform delivers...