INTERNATIONAL PATENT: KYOCERA CORPORATION, 京セラ株式会社 FILES APPLICATION FOR "ELECTRODE MATERIAL, ELECTRODE MEMBER, ELECTRODE PAIR AND ELECTROCHEMICAL DEVICE"

GENEVA, Dec. 23 -- KYOCERA CORPORATION (6, Takeda Tobadono-cho, Fushimi-ku, Kyoto-shi, Kyoto6128501), 京セラ株式会社 (京都府京都... Read More

INTERNATIONAL PATENT: KAO CORPORATION, 花王株式会社 FILES APPLICATION FOR "OIL-IN-WATER TYPE EMULSION COSMETIC"

GENEVA, Dec. 23 -- KAO CORPORATION (14-10, Nihonbashi Kayabacho 1-chome, Chuo-ku, Tokyo1038210), 花王株式会社 (東京都中央区&#260... Read More

INTERNATIONAL PATENT: UBE CORPORATION, ＵＢＥ株式会社 FILES APPLICATION FOR "CRYSTALLINE SILICON NITRIDE POWDER, SILICON NITRIDE SINTERED BODY CONTAINING SAID POWDER, METHOD FOR PRODUCING SILICON NITRIDE SINTERED BODY, ARTICLE CONTAINING SAID SINTERED BODY AND VEHICLE"

GENEVA, Dec. 23 -- UBE CORPORATION (1978-96, Oaza Kogushi, Ube-shi, Yamaguchi7558633), ＵＢＥ株式会社 (山口県宇部市&#22823... Read More

INTERNATIONAL PATENT: NIDEC ADVANCE TECHNOLOGY CORPORATION, ニデックアドバンステクノロジー株式会社 FILES APPLICATION FOR "INSULATION INSPECTION DEVICE AND INSULATION INSPECTION METHOD"

GENEVA, Dec. 23 -- NIDEC ADVANCE TECHNOLOGY CORPORATION (Nidec PARK Bldg. C, 1-1 Higashinokuchi, Morimoto-cho, Muko-shi, Kyoto6170003), ニデックアドバン... Read More

INTERNATIONAL PATENT: STANLEY ELECTRIC CO., LTD., スタンレー電気株式会社, INSTITUTE OF SCIENCE TOKYO, 国立大学法人東京科学大学 FILES APPLICATION FOR "ORGANIC SEMICONDUCTOR PHOTODETECTOR AND METHOD FOR MANUFACTURING SAME"

GENEVA, Dec. 23 -- STANLEY ELECTRIC CO., LTD. (2-9-13 Nakameguro, Meguro-ku, Tokyo1538636), スタンレー電気株式会社 (東京&#... Read More

INTERNATIONAL PATENT: NATIONAL UNIVERSITY CORPORATION TOKAI NATIONAL HIGHER EDUCATION AND RESEARCH SYSTEM, 国立大学法人東海国立大学機構, NU-REI CO., LTD., ＮＵ－ＲＥＩ株式会社 FILES APPLICATION FOR "POWER STORAGE DEVICE"

GENEVA, Dec. 23 -- NATIONAL UNIVERSITY CORPORATION TOKAI NATIONAL HIGHER EDUCATION AND RESEARCH SYSTEM (1, Furo-cho, Chikusa-ku, Nagoya-shi Aichi4648601), 国立大学法&#201... Read More

INTERNATIONAL PATENT: RESONAC CORPORATION, 株式会社レゾナック FILES APPLICATION FOR "RELEASE FILM, BASE MATERIAL FOR RELEASE FILM, METHOD FOR PRODUCING RELEASE FILM AND METHOD FOR PRODUCING SEMICONDUCTOR PACKAGE"

GENEVA, Dec. 23 -- RESONAC CORPORATION (9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo1057325), 株式会社レゾナック (東京都&#28... Read More

INTERNATIONAL PATENT: NIPPON STEEL CORPORATION, 日本製鉄株式会社 FILES APPLICATION FOR "MANUFACTURING METHOD AND MANUFACTURING DEVICE FOR LAMINATED CORE"

GENEVA, Dec. 23 -- NIPPON STEEL CORPORATION (6-1, Marunouchi 2-chome, Chiyoda-ku, Tokyo1008071), 日本製鉄株式会社 (東京都千&#201... Read More

INTERNATIONAL PATENT: JSR CORPORATION, ＪＳＲ株式会社 FILES APPLICATION FOR "RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD AND ONIUM SALT COMPOUND"

GENEVA, Dec. 23 -- JSR CORPORATION (9-2, Higashi-Shinbashi 1-chome, Minato-ku, Tokyo1058640), ＪＳＲ株式会社 (東京都港区東... Read More

INTERNATIONAL PATENT: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD., パナソニックＩＰマネジメント株式会社 FILES APPLICATION FOR "INFORMATION PROCESSING DEVICE AND INFORMATION PROCESSING METHOD"

GENEVA, Dec. 23 -- PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (22-6, Moto-machi, Kadoma-shi, Osaka5710057), パナソニックＩＰマネ&#... Read More

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