INTERNATIONAL PATENT: NIPPON STEEL CORPORATION, 日本製鉄株式会社 FILES APPLICATION FOR "BLAST FURNACE OPERATION METHOD"

GENEVA, May 19 -- NIPPON STEEL CORPORATION (6-1, Marunouchi 2-chome, Chiyoda-ku, Tokyo1008071), 日本製鉄株式会社 (東京都千&#2019... Read More

INTERNATIONAL PATENT: MURATA MANUFACTURING CO., LTD., 株式会社村田製作所 FILES APPLICATION FOR "MULTILAYER STRUCTURE AND METHOD FOR MANUFACTURING SAME"

GENEVA, May 19 -- MURATA MANUFACTURING CO., LTD. (10-1, Higashikotari 1-chome, Nagaokakyo-shi, Kyoto6178555), 株式会社村田製作所 (京都... Read More

INTERNATIONAL PATENT: AGC INC., ＡＧＣ株式会社 FILES APPLICATION FOR "ELECTROMAGNETIC WAVE REFLECTION FILM"

GENEVA, May 19 -- AGC INC. (5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008405), ＡＧＣ株式会社 (東京都千代田区&#2002... Read More

INTERNATIONAL PATENT: MITSUBISHI GAS CHEMICAL COMPANY, INC., 三菱瓦斯化学株式会社 FILES APPLICATION FOR "AMINE-BASED CURING AGENT, CURABLE RESIN COMPOSITION, CURED PRODUCT, DECOMPOSITION METHOD FOR CURED PRODUCT AND RECOVERY METHOD FOR FILLER"

GENEVA, May 19 -- MITSUBISHI GAS CHEMICAL COMPANY, INC. (5-2, Marunouchi 2-chome, Chiyoda-ku, Tokyo1008324), 三菱瓦斯化学株式会社 (東&... Read More

INTERNATIONAL PATENT: NIKON CORPORATION, 株式会社ニコン FILES APPLICATION FOR "METHOD FOR MANUFACTURING SUBSTRATE FOR PHOTOMASK, METHOD FOR MANUFACTURING PHOTOMASK BLANK, METHOD FOR MANUFACTURING PHOTOMASK, METHOD FOR REUSING SUBSTRATE FOR PHOTOMASK, PHOTOMASK, SUBSTRATE FOR PHOTOMASK AND PHOTOMASK BLANKS"

GENEVA, May 19 -- NIKON CORPORATION (1-5-20, Nishioi, Shinagawa-ku, Tokyo1408601), 株式会社ニコン (東京都品川区西&#2... Read More

INTERNATIONAL PATENT: RESONAC CORPORATION, 株式会社レゾナック FILES APPLICATION FOR "PHOTOSENSITIVE RESIN COMPOSITION, CURED OBJECT AND SEMICONDUCTOR ELEMENT"

GENEVA, May 19 -- RESONAC CORPORATION (9-1, Higashi-Shimbashi 1-chome, Minato-ku, Tokyo1057325), 株式会社レゾナック (東京都&#282... Read More

INTERNATIONAL PATENT: AESC JAPAN LTD., 株式会社ＡＥＳＣジャパン FILES APPLICATION FOR "BATTERY CELL"

GENEVA, May 19 -- AESC JAPAN LTD. (K-Tower Yokohama, 6-2-12 Minatomirai, Nishi-ku, Yokohama-shi, Kanagawa2200012), 株式会社ＡＥＳＣジャ&#124... Read More

INTERNATIONAL PATENT: UNICHARM CORPORATION, ユニ・チャーム株式会社 FILES APPLICATION FOR "ABSORBENT SHEET AND SYSTEM LITTER BOX FOR PET"

GENEVA, May 19 -- UNICHARM CORPORATION (182, Shimobun, Kinsei-cho, Shikokuchuo-City, Ehime7990111), ユニ・チャーム株式会社 (愛&#... Read More

INTERNATIONAL PATENT: IDEMITSU KOSAN CO.,LTD., 出光興産株式会社, NIKKISO CO., LTD., 日機装株式会社, NATIONAL UNIVERSITY CORPORATION TOKAI NATIONAL HIGHER EDUCATION AND RESEARCH SYSTEM, 国立大学法人東海国立大学機構 FILES APPLICATION FOR "UV-EMITTING ELEMENT"

GENEVA, May 19 -- IDEMITSU KOSAN CO.,LTD. (2-1, Otemachi 1-chome, Chiyoda-ku, Tokyo1008321), 出光興産株式会社 (東京都千代&... Read More

INTERNATIONAL PATENT: KYOTO UNIVERSITY, 国立大学法人京都大学 FILES APPLICATION FOR "TARGET-MOLECULE-SPECIFIC FUNCTIONAL PROTEIN CONTROL SYSTEM"

GENEVA, May 19 -- KYOTO UNIVERSITY (36-1, Yoshida-honmachi, Sakyo-ku, Kyoto-shi, Kyoto6068501), 国立大学法人京都大学 (京都&#2422... Read More

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