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INTERNATIONAL PATENT: SMTECH CO., LTD., (주)에스엠테크 FILES APPLICATION FOR "HIGH-SPEED STORAGE APPARATUS FOR HYDRAULIC SHOCK DATA ON WATER LEVEL AND FLOW RATE"

GENEVA, July 9 -- SMTECH CO., LTD. ((Chunui-dong) 201-1204, 18 Bucheon-ro 198beon-gilBucheon-siGyeonggi-do 14557), (주)에스엠테크 (경기도부&... Read More


INTERNATIONAL PATENT: LG ELECTRONICS INC., 엘지전자 주식회사 FILES APPLICATION FOR "DISPLAY DEVICE"

GENEVA, July 9 -- LG ELECTRONICS INC. (128, Yeoui-daero,Yeongdeungpo-guSeoul 07336), 엘지전자 주식회사 (서울특별시영... Read More


INTERNATIONAL PATENT: KOREA ELECTRONICS TECHNOLOGY INSTITUTE, 한국전자기술연구원 FILES APPLICATION FOR "METHOD FOR MANAGING STATE OF RUNTIME ENVIRONMENT SUPPORTING VIRTUAL OPERATION"

GENEVA, July 9 -- KOREA ELECTRONICS TECHNOLOGY INSTITUTE (25, Saenari-ro,Bundang-gu, Seongnam-si,Gyeonggi-do 13509), 한국전자기술연구원 (경&... Read More


INTERNATIONAL PATENT: JMINTL CO., LTD., 주식회사 제이엠아이엔티엘 FILES APPLICATION FOR "FOLDABLE WAGON ENABLING SELF-BOARDING OF PET"

GENEVA, July 9 -- JMINTL CO., LTD. (2-dong, 31, Bukhang-ro 193beon-gilSeo-guIncheon 22856), 주식회사 제이엠아이엔티엘 (인&... Read More


INTERNATIONAL PATENT: NHK SPRING CO., LTD., 日本発條株式会社 FILES APPLICATION FOR "SEGMENT COIL MANAGEMENT METHOD AND DEVICE"

GENEVA, July 9 -- NHK SPRING CO., LTD. (3-10, Fukuura, Kanazawa-ku, Yokohama-shi Kanagawa2360004), 日本発條株式会社 (神奈川県&#2... Read More


INTERNATIONAL PATENT: MICIN, INC., 株式会社MICIN FILES APPLICATION FOR "SYSTEM FOR MANAGING ADVERSE EVENTS ASSOCIATED WITH TREATMENT, METHOD FOR MANAGING ADVERSE EVENTS ASSOCIATED WITH TREATMENT AND PROGRAM"

GENEVA, July 9 -- MICIN, INC. (KDX Nishi-Shinbashi Bldg F4, 3-3-1, Nishi-Shinbashi, Minato-ku, Tokyo1050003), 株式会社MICIN (東京... Read More


INTERNATIONAL PATENT: MMC RYOTEC CORPORATION, MMCリョウテック株式会社 FILES APPLICATION FOR "DEVICE AND METHOD FOR FORMING COATING LAYER"

GENEVA, July 9 -- MMC RYOTEC CORPORATION (1528, Aza Nakashinden, Oaza Yokoi, Godo-cho, Anpachi-gun, Gifu5032301), MMCリョウテック株&#2433... Read More


INTERNATIONAL PATENT: KUBOTA CORPORATION, 株式会社クボタ FILES APPLICATION FOR "CABIN"

GENEVA, July 9 -- KUBOTA CORPORATION (1-2-47, Shikitsuhigashi, Naniwa-ku, Osaka-shi, Osaka5568601), 株式会社クボタ (大阪府大阪&#... Read More


INTERNATIONAL PATENT: FUJIFILM CORPORATION, 富士フイルム株式会社 FILES APPLICATION FOR "ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE AND COMPOUND"

GENEVA, July 9 -- FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome, Minato-ku, Tokyo1068620), 富士フイルム株式会社 (東京都&... Read More


INTERNATIONAL PATENT: KYOCERA CORPORATION, 京セラ株式会社 FILES APPLICATION FOR "MULTILAYERED SUBSTRATE"

GENEVA, July 9 -- KYOCERA CORPORATION (6, Takeda Tobadono-cho, Fushimi-ku, Kyoto-shi, Kyoto6128501), 京セラ株式会社 (京都府京都&... Read More