Exclusive

Publication

Byline

Location

INTERNATIONAL PATENT: KYOCERA CORPORATION, 京セラ株式会社 FILES APPLICATION FOR "METHOD FOR MANUFACTURING MULTILAYER CERAMIC ELECTRONIC COMPONENT"

GENEVA, July 14 -- KYOCERA CORPORATION (6, Takeda Tobadono-cho, Fushimi-ku, Kyoto-shi, Kyoto6128501), 京セラ株式会社 (京都府京都... Read More


INTERNATIONAL PATENT: ROHTO PHARMACEUTICAL CO., LTD., ロート製薬株式会社 FILES APPLICATION FOR "OPHTHALMIC COMPOSITION"

GENEVA, July 14 -- ROHTO PHARMACEUTICAL CO., LTD. (1-8-1, Tatsumi-nishi, Ikuno-ku, Osaka-shi, Osaka5448666), ロート製薬株式会社 (大阪&... Read More


INTERNATIONAL PATENT: TOSOH CORPORATION, 東ソー株式会社 FILES APPLICATION FOR "ELECTRODE ACTIVE MATERIAL FOR SECONDARY BATTERY, METHOD FOR PRODUCING SAME AND ALKALINE MANGANESE SECONDARY BATTERY"

GENEVA, July 14 -- TOSOH CORPORATION (4560, Kaisei-cho, Shunan-shi, Yamaguchi7468501), 東ソー株式会社 (山口県周南市&#38283... Read More


INTERNATIONAL PATENT: DENSO CORPORATION FILES APPLICATION FOR "METHOD AND SYSTEM FOR DIAGNOSTIC SERVICES WITH REMOTE ATTESTATION"

GENEVA, July 14 -- DENSO CORPORATION (1-1, Showa-cho, Kariya-city Aichi4488661) filed a patent application (PCT/JP2024/042803) for "METHOD AND SYSTEM FOR DIAGNOSTIC SERVICES WITH REMOTE ATTESTATION" o... Read More


INTERNATIONAL PATENT: ASTEMO, LTD., ASTEMO株式会社 FILES APPLICATION FOR "SOFTWARE UPDATE SYSTEM"

GENEVA, July 14 -- ASTEMO, LTD. (2-1, Otemachi 2-chome, Chiyoda-ku, Tokyo1000004), Astemo株式会社 (東京都千&#2... Read More


INTERNATIONAL PATENT: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY, 한국과학기술원 FILES APPLICATION FOR "METHOD FOR MEASURING LOCATION OF COMMUNICATION DEVICE USING FREQUENCY MODULATION CONTINUOUS WAVE (FMCW) RADAR"

GENEVA, July 14 -- KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (291 Daehak-roYuseong-guDaejeon 34141), 한국과학기술원 (대전광역... Read More


INTERNATIONAL PATENT: SHISEIDO COMPANY, LTD., 株式会社資生堂 FILES APPLICATION FOR "DOUBLE CONTAINER, REFILL CONTAINER AND METHOD FOR MANUFACTURING REFILL CONTAINER"

GENEVA, July 14 -- SHISEIDO COMPANY, LTD. (5-5, Ginza 7-chome, Chuo-ku, Tokyo1040061), 株式会社資生堂 (東京都中央区&#37504... Read More


INTERNATIONAL PATENT: FUJIFILM CORPORATION, 富士フイルム株式会社 FILES APPLICATION FOR "ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE AND COMPOUND"

GENEVA, July 14 -- FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome, Minato-ku, Tokyo1068620), 富士フイルム株式会社 (東京都... Read More


INTERNATIONAL PATENT: PRG S&TECH INC., (주)피알지에스앤텍 FILES APPLICATION FOR "METHOD FOR PREPARING NOVEL COMPOUND"

GENEVA, July 14 -- PRG S&TECH INC. ((Guseo-dong) 9F, 252 Geumjeong-roGeumjeong-guBusan 46274), (주)피알지에스앤텍 (부산광역&#498... Read More


INTERNATIONAL PATENT: AGC INC., AGC株式会社 FILES APPLICATION FOR "FAR INFRARED TRANSMITTING UNIT AND VEHICLE GLASS"

GENEVA, July 14 -- AGC INC. (5-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo1008405), AGC株式会社 (東京都千代田区&#200... Read More