US Patent Issued to TOKYO OHKA KOGYO on Dec. 16 for "Resist composition, method of forming resist pattern, and compound" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,498,635, issued on Dec. 16, was assigned to TOKYO OHKA KOGYO Co. LTD. (Kawasaki, Japan).

"Resist composition, method of forming resist pattern, and compound" was invented by KhanhTin Nguyen (Kawasaki, Japan), Mari Murata (Kawasaki, Japan), Masatoshi Arai (Kawasaki, Japan) and Nobuhiro Michibayashi (Kawasaki, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A resist composition including a base material component (A) whose solubility in a developing solution is changed due to the action of an acid, and a compound (D0) formed of an anion moiety and a cation moiety which is represented by Formula (d0), in which the cation moiety of the compound (D0) ha...