INTERNATIONAL PATENT: GLOBAL POLYACETAL CO., LTD., グローバルポリアセタール株式会社 FILES APPLICATION FOR "RESIN COMPOSITION, PELLET AND MOLDED ARTICLE"

GENEVA, July 3 -- GLOBAL POLYACETAL CO., LTD. (9-2, Higashi-shinbashi 1-chome, Minato-ku, Tokyo1050021), グローバルポリアセター&#12523... Read More

INTERNATIONAL PATENT: KYOCERA CORPORATION, 京セラ株式会社 FILES APPLICATION FOR "LIGHT SOURCE MODULE AND LIGHT IRRADIATION DEVICE"

GENEVA, July 3 -- KYOCERA CORPORATION (6, Takeda Tobadono-cho, Fushimi-ku, Kyoto-shi, Kyoto6128501), 京セラ株式会社 (京都府京都&... Read More

INTERNATIONAL PATENT: SEKISUI KASEI CO., LTD., 積水化成品工業株式会社 FILES APPLICATION FOR "REGENERATED EXPANDABLE STYRENE-BASED RESIN PARTICLES, REGENERATED PREFOAMED STYRENE-BASED RESIN PARTICLES AND REGENERATED STYRENE-BASED RESIN FOAM MOLDING"

GENEVA, July 3 -- SEKISUI KASEI CO., LTD. (4-4, Nishitenma 2-chome, Kita-ku, Osaka-shi, Osaka5308565), 積水化成品工業株式会社 (&#22823... Read More

INTERNATIONAL PATENT: NAGAKI SEIKI CO., LTD., 株式会社永木精機 FILES APPLICATION FOR "INSTALLATION AID TOOL FOR BELLOWS TUBE"

GENEVA, July 3 -- NAGAKI SEIKI CO., LTD. (4-31, Tashiden 3-chome, Daito-shi, Osaka5740045), 株式会社永木精機 (大阪府大東&#... Read More

INTERNATIONAL PATENT: TOPPAN HOLDINGS INC., ＴＯＰＰＡＮホールディングス株式会社 FILES APPLICATION FOR "METASURFACE STRUCTURE AND MOLD"

GENEVA, July 3 -- TOPPAN HOLDINGS INC. (5-1, Taito 1-chome, Taito-ku, Tokyo1100016), ＴＯＰＰＡＮホールディングス&#2... Read More

INTERNATIONAL PATENT: SENJU METAL INDUSTRY CO., LTD., 千住金属工業株式会社 FILES APPLICATION FOR "CONVEYING CLAW AND SOLDERING DEVICE"

GENEVA, July 3 -- SENJU METAL INDUSTRY CO., LTD. (23, Senju-Hashido-cho, Adachi-ku, Tokyo1208555), 千住金属工業株式会社 (東京&#3... Read More

INTERNATIONAL PATENT: EXTEND CO., LTD., 株式会社ＥＸＴＥＮＤ FILES APPLICATION FOR "DIAGNOSTIC DEVICE, DIAGNOSTIC SYSTEM USING SAME AND PROGRAM TO BE EXECUTED BY COMPUTER"

GENEVA, July 3 -- EXTEND CO., LTD. (259, Kuranoue 2-chome, Tosu-shi, Saga8410056), 株式会社ＥｘｔｅｎＤ (佐賀県鳥&#2... Read More

INTERNATIONAL PATENT: SONY SEMICONDUCTOR SOLUTIONS CORPORATION, ソニーセミコンダクタソリューションズ株式会社 FILES APPLICATION FOR "INFORMATION PROCESSING DEVICE, CORRECTION METHOD AND CORRECTION PROGRAM"

GENEVA, July 3 -- SONY SEMICONDUCTOR SOLUTIONS CORPORATION (4-14-1, Asahi-cho, Atsugi-shi, Kanagawa2430014), ソニーセミコンダクタソ&#1... Read More

INTERNATIONAL PATENT: JSR CORPORATION, ＪＳＲ株式会社 FILES APPLICATION FOR "RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD AND RADIATION-SENSITIVE ACID GENERATION AGENT"

GENEVA, July 3 -- JSR CORPORATION (9-2, Higashi-Shinbashi 1-chome, Minato-ku, Tokyo1058640), ＪＳＲ株式会社 (東京都港区東&... Read More

INTERNATIONAL PATENT: IDEMITSU KOSAN CO.,LTD., 出光興産株式会社 FILES APPLICATION FOR "RESIN, ELECTRONIC SUBSTRATE MATERIAL, COATING LIQUID COMPOSITION, FILM, SHEET, ELECTRONIC SUBSTRATE AND RESIN PRODUCTION METHOD"

GENEVA, July 3 -- IDEMITSU KOSAN CO.,LTD. (2-1, Otemachi 1-chome, Chiyoda-ku, Tokyo1008321), 出光興産株式会社 (東京都千代&... Read More

• ««
• «
• 93403
• 93404
• 93405
• 93406
• 93407
• 93408
• 93409
• 93410
• 93411
• 93412
• »
• »»