INTERNATIONAL PATENT: WATANABE OYSTER LABORATORY, CO., LTD., 株式会社渡辺オイスター研究所 FILES APPLICATION FOR "CALCIFICATION ENHANCER FOR OSTEOBLAST MC3T3-E1 CELL"

GENEVA, March 25 -- WATANABE OYSTER LABORATORY, CO., LTD. (490-3 Shimoongatamachi, Hachioji-shi, Tokyo1920154), 株式会社渡辺オイスター... Read More

INTERNATIONAL PATENT: KANTATSU CO., LTD., カンタツ株式会社 FILES APPLICATION FOR "IMAGING LENS"

GENEVA, March 25 -- KANTATSU CO., LTD. (Shinagawa Seaside Canal Tower 22F, 4-12-6, Higashishinagawa, Shinagawa-ku, Tokyo1400002), カンタツ株式会社 (&#26... Read More

INTERNATIONAL PATENT: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY, 国立研究開発法人産業技術総合研究所 FILES APPLICATION FOR "METHOD FOR CONTROLLING FISH PATHOGENIC BACTERIA OF PHYLUM BACTEROIDOTA"

GENEVA, March 25 -- NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (3-1, Kasumigaseki 1-chome, Chiyoda-ku, Tokyo1008921), 国立研究開発法&#20... Read More

INTERNATIONAL PATENT: ROHM CO., LTD., ローム株式会社 FILES APPLICATION FOR "ELECTRONIC DEVICE AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE"

GENEVA, March 25 -- ROHM CO., LTD. (21, Saiin Mizosaki-cho, Ukyo-ku, Kyoto-shi, Kyoto6158585), ローム株式会社 (京都府京都&#24066... Read More

INTERNATIONAL PATENT: TOKYO OHKA KOGYO CO., LTD., 東京応化工業株式会社 FILES APPLICATION FOR "RESIST MATERIAL AND METHOD FOR PRODUCING SAME"

GENEVA, March 25 -- TOKYO OHKA KOGYO CO., LTD. (150, Nakamaruko, Nakahara-ku, Kawasaki-shi, Kanagawa2110012), 東京応化工業株式会社 (神... Read More

INTERNATIONAL PATENT: STAR MICRONICS CO., LTD., スター精密株式会社 FILES APPLICATION FOR "TASK ASSISTANCE SYSTEM, TASK ASSISTANCE DEVICE AND TASK ASSISTANCE METHOD"

GENEVA, March 25 -- STAR MICRONICS CO., LTD. (20-10 Nakayoshida, Suruga-ku, Shizuoka-shi, Shizuoka4228654), スター精密株式会社 (静岡&#... Read More

INTERNATIONAL PATENT: AESC JAPAN LTD., 株式会社ＡＥＳＣジャパン FILES APPLICATION FOR "BATTERY PACK"

GENEVA, March 25 -- AESC JAPAN LTD. (K-Tower Yokohama, 6-2-12 Minatomirai, Nishi-ku, Yokohama-shi, Kanagawa2200012), 株式会社ＡＥＳＣジャ&#1... Read More

INTERNATIONAL PATENT: FUJIFILM CORPORATION, 富士フイルム株式会社 FILES APPLICATION FOR "ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE"

GENEVA, March 25 -- FUJIFILM CORPORATION (26-30, Nishiazabu 2-chome, Minato-ku, Tokyo1068620), 富士フイルム株式会社 (東京&#37117... Read More

INTERNATIONAL PATENT: MURATA MANUFACTURING CO., LTD. FILES APPLICATION FOR "REDUCTION OF EDGE TRANSISTOR LEAKAGE OF N-TYPE EDMOS AND LDMOS DEVICES"

GENEVA, March 25 -- MURATA MANUFACTURING CO., LTD. (10-1, Higashikotari 1-chome, Nagaokakyo-shi, Kyoto6178555) filed a patent application (PCT/JP2024/031783) for "REDUCTION OF EDGE TRANSISTOR LEAKAGE ... Read More

INTERNATIONAL PATENT: NISSAN CHEMICAL CORPORATION, 日産化学株式会社 FILES APPLICATION FOR "METAL OXIDE SOL CONTAINING POLYMERIZABLE SILANE COMPOUND AND METHOD FOR PRODUCING SAME"

GENEVA, March 25 -- NISSAN CHEMICAL CORPORATION (5-1, Nihonbashi 2-chome, Chuo-ku, Tokyo1036119), 日産化学株式会社 (東京都中&#22... Read More

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