US Patent Issued to Zhuhai ACCESS Semiconductor on Oct. 21 for "Substrate embedded with integrated inductor and manufacturing method thereof" (Chinese Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,451,447, issued on Oct. 21, was assigned to Zhuhai ACCESS Semiconductor Co. Ltd. (Guangdong, China).

"Substrate embedded with integrated inductor and manufacturing method thereof" was invented by Xianming Chen (Guangdong, China), Xiaowei Xu (Guangdong, China), Juchen Huang (Guangdong, China), Benxia Huang (Guangdong, China) and Gao Huang (Guangdong, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "A manufacturing method for a substrate embedded with integrated inductor includes: providing a bearing plate; manufacturing a first conduction copper column on the bearing plate; arranging a first dielectric layer on the bearing plate which covers the firs...