US Patent Issued to ZHEJIANG UNIVERSITY on Sept. 23 for "Enhanced graphene structure based on weak coupling, graphene film, and photoelectric device" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,421,119, issued on Sept. 23, was assigned to ZHEJIANG UNIVERSITY (Hangzhou, China).

"Enhanced graphene structure based on weak coupling, graphene film, and photoelectric device" was invented by Chao Gao (Hangzhou, China), Li Peng (Hangzhou, China), Lingfei Li (Hangzhou, China), Wenzhang Fang (Hangzhou, China) and Yingjun Liu (Hangzhou, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "A weakly coupled enhanced graphene film includes an enhanced graphene structure based on weak coupling, wherein the enhanced graphene structure based on weak coupling comprises a plurality of graphene units stacked vertically; the graphene unit is a single graphene she...