ALEXANDRIA, Va., June 16 -- United States Patent no. 12,305,274, issued on May 20, was assigned to ZHEJIANG SHINTOWN INDUSTRY Co. LTD (Zhejiang, China).
"PVD target and use thereof" was invented by Jianzhong Tang (Zhejiang, China), Mingwei Zhang (Zhejiang, China) and Yiqi Yao (Zhejiang, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present application discloses a PVD target, the PVD target consists of the following components by mass percentage: silicon 10-30% and a balance metal, the metal includes one or more selected from a group consisting of chromium, zirconium, and titanium. The PVD target provided in the present application can form a composite film composed of metal, silicon, metal nitride...