ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,544,806, issued on Feb. 10, was assigned to ZEUS Co. LTD. (Hwaseong-si, South Korea).
"Wafer cleaning apparatus" was invented by Sanghoon Lee (Suwon-si, South Korea), Jiho Park (Hwaseong-si, South Korea), Woon Kong (Cheonan-si, South Korea) and Ungjo Moon (Osan-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A wafer cleaning apparatus according to the present disclosure includes a rotary table that supports and rotates a wafer so that the wafer rotates about a rotational axis, and an ultrasonic vibration device that vibrates a liquid film so that vibration having an ultrasonic frequency is generated in the liquid film formed on an upper s...