ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,433,394, issued on Oct. 7, was assigned to Yunslab Co. Ltd. (Siheung-si, South Korea).

"Wafer cleaning brush" was invented by Jeong Hye Yoon (Seoul, South Korea), Sung Taek Kim (Seoul, South Korea) and Chi Hyung Kim (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A wafer cleaning brush includes: a brush including a hollow formed inside the brush and through which a cleaning liquid is discharged, and a plurality of protrusions formed on an outer surface of the brush; and a film surrounding the outer surface of the brush, wherein the film includes a plurality of holes through which the protrusions pass."

The patent was filed on Dec. 20,...