US Patent Issued to YOUNG CHANG CHEMICAL on Aug. 26 for "Process liquid composition for lithography and pattern forming method using same" (South Korean Inventors)

ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,398,342, issued on Aug. 26, was assigned to YOUNG CHANG CHEMICAL Co. LTD (Gyeongsangbuk-do, South Korea).

"Process liquid composition for lithography and pattern forming method using same" was invented by Su Jin Lee (Daegu, South Korea), Gi Hong Kim (Daegu, South Korea), Seung Hun Lee (Daegu, South Korea) and Seung Hyun Lee (Daegu, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Proposed is a process liquid composition for improving a lifting defect level of a photoresist pattern containing a surfactant and for reducing the number of defects of the photoresist pattern, the composition containing a surfactant and having a surface tension of 40...