US Patent Issued to Yiguan Information Technology (Shanghai) on April 22 for "Method for preparing a self-supporting substrate from a film base structure comprising a first substrate layer, a first film layer, and a second substrate layer" (Chinese Inventor)

ALEXANDRIA, Va., June 6 -- United States Patent no. 12,281,408, issued on April 22, was assigned to Yiguan Information Technology (Shanghai) Co. Ltd. (Shanghai).

"Method for preparing a self-supporting substrate from a film base structure comprising a first substrate layer, a first film layer, and a second substrate layer" was invented by Tao Jiang (Kunshan, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for preparing a self-supporting substrate includes: preparing a thin film base structure including a first substrate layer, a thin film layer and a second substrate layer stacked in sequence; removing the first substrate layer from the thin film layer; continuing to grow a material the same as...