ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,387,946, issued on Aug. 12, was assigned to YIELD ENGINEERING SYSTEMS INC. (Fremont, Calif.).

"Double-sided scrubber for substrate cleaning" was invented by Rajeev Bajaj (San Jose, Calif.) and Al Stone (Bloomingdale, Ill.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate cleaning device includes a double-sided scrubber that directs a liquid to a substrate as it moves back-and-forth between a pair of rotating brushes. The device may also include a first set of nozzles and a second set of nozzles. The first set of nozzles may be configured to spray a first liquid at an interface between the substrate and rotating brushes and the second set of noz...