US Patent Issued to XSYS PREPRESS on Aug. 19 for "Method and system for applying a pattern on a mask layer" (Belgian Inventor)

ALEXANDRIA, Va., Aug. 20 -- United States Patent no. 12,391,034, issued on Aug. 19, was assigned to XSYS PREPRESS N.V. (Ypres, Belgium).

"Method and system for applying a pattern on a mask layer" was invented by Dirk Ludo Julien De Rauw (Ninove, Belgium).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for applying a pattern on a mask layer includes obtaining an image file representing pixels with a first pixel size in a first direction parallel to an edge of the pixel, and a second pixel size in a second direction perpendicular to the first direction, where the first and second pixel size are the same or different, treating the mask layer such that a plurality of areas with altered physical properties...