US Patent Issued to XSYS GERMANY on May 27 for "Photopolymerizable relief precursor having adjustable surface properties" (German, American Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,313,970, issued on May 27, was assigned to XSYS GERMANY GMBH (Willstatt, Germany).

"Photopolymerizable relief precursor having adjustable surface properties" was invented by Matthias Beyer (Weinheim, Germany), Armin Becker (GroBniedesheim, Germany), Torben Wendland (Renningen, Germany), Isabel Schlegel (Rastatt, Germany), Peter J Fronczkiewicz (Lake Wylie, S.C.) and Anja Wundling (Rheinau, Germany).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photopolymerisable relief precursor includes a dimensionally stable carrier, and a photopolymerisable relief-forming layer at least containing a crosslinkable elastomeric binder, an ethylenically unsaturated mon...