US Patent Issued to XI'AN JIAOTONG UNIVERSITY on Sept. 9 for "Optical measuring device and method for plasma magnetic field with adjustable sensitivity" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,411,189, issued on Sept. 9, was assigned to XI'AN JIAOTONG UNIVERSITY (Xi'an, China).

"Optical measuring device and method for plasma magnetic field with adjustable sensitivity" was invented by Jian Wu (Xi'an, China), Zhiyuan Jiang (Xi'an, China), Ziwei Chen (Xi'an, China), Zhenyu Wang (Xi'an, China), Wei Wang (Xi'an, China), Xinmiao Zhou (Xi'an, China), Huantong Shi (Xi'an, China) and Xingwen Li (Xi'an, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure discloses an optical measurement device and method for a plasma magnetic field with adjustable sensitivity. The method comprises the following steps: constructing an optical ro...