US Patent Issued to WUHAN YUWEI OPTICAL SOFTWARE on May 20 for "Optical imaging method, device and system for photolithography system" (Chinese Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,306,543, issued on May 20, was assigned to WUHAN YUWEI OPTICAL SOFTWARE Co. LTD. (Hubei, China).

"Optical imaging method, device and system for photolithography system" was invented by Haiqing Wei (Hubei, China) and Xianhua Ke (Hubei, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "Methods, devices, and systems of optical imaging simulation for a photolithography system are provided, including: determining a photolithographic imaging model based on a transmission cross coefficient and mask near-field distribution, solving a transmission cross coefficient based on a Lanczos method, using a parity operator to ensure the symmetric properties of the tr...