US Patent Issued to WUHAN UNIVERSITY OF SCIENCE AND TECHNOLOGY on July 1 for "Method for purifying silicon by means of phase separation dealloying reaction" (Chinese Inventors)

ALEXANDRIA, Va., July 3 -- United States Patent no. 12,344,530, issued on July 1, was assigned to WUHAN UNIVERSITY OF SCIENCE AND TECHNOLOGY (Hubei, China).

"Method for purifying silicon by means of phase separation dealloying reaction" was invented by Kaifu Huo (Hubei, China), Biao Gao (Hubei, China) and Weili An (Hubei, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "The invention provides a method for purifying silicon by means of a phase separation dealloying reaction, including: mixing a silicon raw material containing metallic or non-metallic impurities with magnesium powder first and then fully reacting under an inert atmosphere so as to obtain a first product; placing the first product in a nitr...