ALEXANDRIA, Va., June 10 -- United States Patent no. 12,291,771, issued on May 6, was assigned to Wuhan Tianma Micro-Electronics Co. Ltd. (Wuhan, China) and Wuhan Tianma Micro-Electronics Co. Ltd. Shanghai Branch (Shanghai).
"Mask device and evaporation device" was invented by Naichao Mu (Wuhan, China), Yuan Li (Wuhan, China), Yu Xin (Wuhan, China), Jun Ma (Wuhan, China) and Lijing Han (Wuhan, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "A mask module includes a framework, a first strip plate fixed on the framework and extending along a first direction, and a first mask. The first mask is located on a side, deviating from the framework, of the first strip plate. The first mask includes at least one p...