US Patent Issued to Wuhan China Star Optoelectronics Semiconductor Display Technology on Aug. 12 for "Method for fabricating array substrate" (Chinese Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,389,678, issued on Aug. 12, was assigned to Wuhan China Star Optoelectronics Semiconductor Display Technology Co. Ltd. (Wuhan, China).

"Method for fabricating array substrate" was invented by Jixiang Gong (Hubei, China), Yixian Zhang (Hubei, China) and Wenxu Xianyu (Hubei, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for fabricating an array substrate, the array substrate, a display panel, and a thin film transistor are provided. The thin film transistor includes a gate electrode, an active layer, a source electrode, a drain electrode, and an interlayer insulating layer. The active layer is disposed corresponding to the gate electrode. ...