US Patent Issued to WORLDBEAM SOLUTION on Oct. 21 for "Extreme-ultraviolet light source device using electron beams" (South Korean Inventor)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,451,316, issued on Oct. 21, was assigned to WORLDBEAM SOLUTION Co. LTD. (Seoul, South Korea).

"Extreme-ultraviolet light source device using electron beams" was invented by Kyu Chang Park (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An extreme-ultraviolet light source device comprises: a discharge chamber of which the inside is maintained in a vacuum; an electron beam-emitting unit which is located inside the discharge chamber and produces electron beams; and a metal radiator which is located inside the discharge chamber and is ionized by the electron beams. Extreme-ultraviolet radiation occurs in plasma generated from the metal ra...