ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,442,077, issued on Oct. 14, was assigned to WONIK IPS Co. LTD. (Pyeongtaek-si, South Korea).
"Substrate processing apparatus" was invented by Tae Dong Kim (Osan-si Gyeonggi-do, South Korea), Jung Hwan Lee (Osan-si Gyeonggi-do, South Korea), Cheong Hwan Jeong (Anseong-si Gyeonggi-do, South Korea), Sung Ho Roh (Yongin-si Gyeonggi-do, South Korea) and Young Jun Kim (Pyeongtaek-si Gyeonggi-do, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to a substrate processing apparatus, and more particularly, to a substrate processing apparatus in which a substrate is processed at a high pressure and a low pressure. The substr...