ALEXANDRIA, Va., Nov. 11 -- United States Patent no. 12,465,940, issued on Nov. 11, was assigned to WONIK IPS Co. LTD. (Pyeongtaek-si, South Korea).
"Substrate processing apparatus" was invented by Da Been Kim (Pyeongtaek-si, South Korea), Jun Hyeong Lee (Pyeongtaek-si, South Korea), Tae Ho Ham (Pyeongtaek-si, South Korea), Cheol Woo Lee (Pyeongtaek-si, South Korea) and Kwang Ha Choi (Pyeongtaek-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed herein is a substrate processing apparatus including a process chamber having a processing space defined therein to process a plurality of substrates, a gas injector provided on a upper side of the process chamber to inject a processing gas into...