US Patent Issued to WONIK IPS on July 29 for "Internal chamber processing method and substrate processing method" (South Korean Inventors)

ALEXANDRIA, Va., July 30 -- United States Patent no. 12,371,783, issued on July 29, was assigned to WONIK IPS Co. LTD. (Pyeongtaek-si, South Korea).

"Internal chamber processing method and substrate processing method" was invented by Ah Young Hwang (Pyeongtaek-si, South Korea), Won Jun Jang (Seoul, South Korea), Joo Suop Kim (Hwaseong-si, South Korea), Kyung Park (Seoul, South Korea), Jin Seo Kim (Seoul, South Korea), Won Sik Ahn (Osan-si, South Korea), Dae Seong Lee (Dongducheon-si, South Korea) and Chang Hun Kim (Osan-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention relates to an internal chamber processing method, and more particularly, to an internal chamber processing...