US Patent Issued to WONIK IPS on Jan. 27 for "Substrate processing apparatus and substrate processing method" (South Korean Inventors)

ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,538,732, issued on Jan. 27, was assigned to WONIK IPS Co. LTD. (Pyeongtaek-si, South Korea).

"Substrate processing apparatus and substrate processing method" was invented by Min Su Kim (Osan-si, South Korea), Sang Jun Park (Yongin-si, South Korea), Ju Hwan Park (Hwaseong-si, South Korea), Byung Chul Cho (Hwaseong-si, South Korea) and Kwang Seon Jin (Osan-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing method using a substrate processing apparatus which comprises a process chamber in which a reaction space is formed to process a substrate in which a composite layer pattern having a plurality of first insulating layer...