ALEXANDRIA, Va., June 9 -- United States Patent no. 12,285,214, issued on April 29, was assigned to Wavefront Dynamics Inc. (Albuquerque, N.M.).
"Wide-field multi-axis aberrometer" was invented by James Copland (Albuquerque, N.M.), Daniel R. Neal (Tijeras, N.M.) and Lyle Kordonowy (Sandia Park, N.M.).
According to the abstract* released by the U.S. Patent & Trademark Office: "This invention relates to optical methods and optical systems for making both on-axis and wide-field, peripheral off-axis wavefront measurements of an eye; and for designing and manufacturing wavefront-guided customized contact lens useful for myopia control. The wide-field optical instrument can comprise either (1) a multi-axis optical configuration using multiple o...