ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,532,724, issued on Jan. 20, was assigned to VueReal Inc. (Waterloo, Canada).
"Preventing electrode discontinuation on microdevice sidewall" was invented by Gholamreza Chaji (Waterloo, Canada) and Ehsanollah Fathi (Waterloo, Canada).
According to the abstract* released by the U.S. Patent & Trademark Office: "This disclosure relates to the process of etching and treatment of side walls while processing microdevices. One aspect is to fill the device wall indentation with a polymer. The disclosure relates to a method and device with its structure to the process of etching and treatment of sidewalls. The methods of etching, coating, and curing are used."
The patent was filed on March 23,...