ALEXANDRIA, Va., Aug. 20 -- United States Patent no. 12,392,024, issued on Aug. 19, was assigned to VTD VAKUUMTECHNIK DRESDEN GMBH (Dresden, Germany).
"Anode for PVD processes" was invented by Wolfgang Fukarek (Dresden, Germany) and Martin Holzherr (Dresden, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "The invention relates to the proposal of an electrode arrangement in a device for carrying out processes of physical vapor deposition that greatly reduces or even prevents the degradation of the electrode material caused by accretions. The contamination of the anode occurring in these processes due to cathodic carbon is minimized or prevented by the application of a thin adhesion-reducing coating of ...