ALEXANDRIA, Va., Oct. 8 -- United States Patent no. 12,437,971, issued on Oct. 7, was assigned to VESTLANDETS INNOVASJONSSELSKAP AS (Bergen, Norway).

"Large area microwave plasma CVD apparatus" was invented by Justas Zalieckas (Bergen, Norway).

According to the abstract* released by the U.S. Patent & Trademark Office: "A large area microwave plasma chemical vapour deposition, LA MPCVD reactor apparatus and method for large area microwave chemical vapour deposition, comprising a reactor chamber adapted to provide a plasma region in an interior of the reactor chamber by electromagnetic energy at a first frequency, and a CRLH waveguide section adapted to operate with an infinite wavelength at the first frequency and having in a wall a couple...