US Patent Issued to Versum Materials US on Sept. 30 for "Compositions and methods using same for deposition of silicon-containing film" (Arizona Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,428,722, issued on Sept. 30, was assigned to Versum Materials US LLC (Tempe, Ariz.).

"Compositions and methods using same for deposition of silicon-containing film" was invented by Jianheng Li (Tempe, Ariz.), Xinjian Lei (Tempe, Ariz.), Raymond Nicholas Vrtis (Tempe, Ariz.), Robert Gordon Ridgeway (Tempe, Ariz.), Dino Sinatore (Tempe, Ariz.) and Manchao Xiao (Tempe, Ariz.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Described herein are compositions and methods using same for forming a silicon-containing film such as without limitation a silicon carbide, silicon nitride, silicon oxide, silicon oxynitride, a carbon-doped silicon nitride, a carbon-dope...