US Patent Issued to Versum Materials US on Oct. 28 for "Compositions and methods using same for deposition of silicon-containing film" (Arizona Inventors)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,454,753, issued on Oct. 28, was assigned to Versum Materials US LLC (Tempe, Ariz.).

"Compositions and methods using same for deposition of silicon-containing film" was invented by Jianheng Li (Tempe, Ariz.), Xinjian Lei (Tempe, Ariz.), Robert G. Ridgeway (Tempe, Ariz.), Raymond N. Vrtis (Tempe, Ariz.), Manchao Xiao (Tempe, Ariz.) and Richard Ho (Tempe, Ariz.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Described herein are compositions and methods using same for forming a silicon-containing film such as without limitation a silicon oxide, silicon nitride, silicon oxynitride, a carbon-doped silicon nitride, or a carbon-doped silicon oxide film on at le...