US Patent Issued to Versum Materials US on May 27 for "Siloxane compositions and methods for using the compositions to deposit silicon containing films" (Arizona Inventors)

ALEXANDRIA, Va., June 17 -- United States Patent no. 12,312,684, issued on May 27, was assigned to Versum Materials US LLC (Tempe, Ariz.).

"Siloxane compositions and methods for using the compositions to deposit silicon containing films" was invented by Jianheng Li (Tempe, Ariz.), Xinjian Lei (Tempe, Ariz.), Raymond N. Vrtis (Tempe, Ariz.) and Robert G. Ridgeway (Tempe, Ariz.).

According to the abstract* released by the U.S. Patent & Trademark Office: "The siloxanes containing compositions and methods are disclosed. The disclosed method relates to a method of depositing a dielectric film on a substrate, the method involving the steps of a) placing the substrate in a reaction chamber; b) introducing a process gas comprising a cyclic silico...