ALEXANDRIA, Va., June 12 -- United States Patent no. 12,298,669, issued on May 13, was assigned to Versum Materials US LLC (Tempe, Ariz.).
"Composition comprising three alkanolamines and a hydroxylamine for removing etch residues" was invented by Laisheng Sun (Gilbert, Ariz.), Lili Wang (Chandler, Ariz.), Aiping Wu (Chandler, Ariz.), Yi-Chia Lee (Chupei, Taiwan) and Tianniu Chen (Westford, Mass.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A method and cleaning composition for microelectronic devices or semiconductor substrates including at least one alkanolamine; at least one hydroxylamine or derivatives of hydroxylamine or mixtures thereof; at least one polyfunctional organic acid with at least two carbo...