ALEXANDRIA, Va., June 4 -- United States Patent no. 12,320,001, issued on June 3, was assigned to Versum Materials US LLC (Tempe, Ariz.).
"Compositions and methods using same for thermal deposition silicon-containing films" was invented by Chandra Haripin (San Marcos, Calif.) and Xinjian Lei (Vista, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "A composition is used in a process for depositing a silicon oxide film or a carbon doped silicon oxide film using a deposition process, wherein the composition includes at least one silicon precursor having a structure represented by Formula I as described herein"
The patent was filed on May 21, 2020, under Application No. 17/612,996.
*For further informatio...