ALEXANDRIA, Va., Feb. 19 -- United States Patent no. 12,230,496, issued on Feb. 18, was assigned to VERSUM MATERIALS US LLC (Tempe, Ariz.).
"Organoaminosilane precursors and methods for depositing films comprising same" was invented by Mark Leonard O'Neill (Queen Creek, Ariz.), Manchao Xiao (San Diego), Xinjian Lei (Vista, Calif.), Richard Ho (Anaheim, Calif.), Haripin Chandra (San Marcos, Calif.), Matthew R. MacDonald (Laguna Niguel, Calif.) and Meiliang Wang (San Marcos, Calif.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Described herein are precursors and methods for forming silicon-containing films. In one aspect, the precursor comprises a compound represented by one of following Formulae A through E ...