US Patent Issued to Versum Materials US on April 1 for "Compositions comprising silacycloalkanes and methods using same for deposition of silicon-containing film" (California, Arizona Inventors)

ALEXANDRIA, Va., April 2 -- United States Patent no. 12,264,258, issued on April 1, was assigned to Versum Materials US LLC (Tempe, Ariz.).

"Compositions comprising silacycloalkanes and methods using same for deposition of silicon-containing film" was invented by Raymond N. Vrtis (Carlsbad, Calif.), Robert G. Ridgeway (Chandler, Ariz.), Xinjian Lei (Vista, Calif.), Ming Li (San Marcos, Calif.) and Manchao Xiao (San Diego).

According to the abstract* released by the U.S. Patent & Trademark Office: "Described herein are compositions and methods using same for forming a silicon-containing film such as without limitation a silicon carbide, silicon oxide, silicon nitride, silicon oxynitride, a carbon-doped silicon nitride, or a carbon-doped si...