ALEXANDRIA, Va., June 4 -- United States Patent no. 12,322,644, issued on June 3, was assigned to Veeco Instruments Inc. (Plainview, Calif.).

"Reactor with centering pin for epitaxial deposition" was invented by Alexander Gurary (Bridgewater, N.J.), Sandeep Krishnan (Jersey City, N.J.), Aniruddha Bagchi (Belle Mead, N.J.), Yuliy Rashkovsky (Milburn, N.J.) and Siddharth Patel (East Windsor, N.J.).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate reactor with centering pin for epitaxial deposition includes a vacuum chamber and a tube configured to rotate in the vacuum chamber around a tube geometrical center axis. A substrate carrier forming a pocket dimensioned for holding a substrate on a top surface...