ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,512,346, issued on Dec. 30, was assigned to Veeco Instruments Inc. (Plainview, N.Y.).

"Scatter melt detection to determine phase transition of semiconductor during laser annealing" was invented by Matthew Earl Wallace Reed (San Jose, Calif.) and Xiaohua Shen (Fremont, Calif.).

According to the abstract* released by the U.S. Patent & Trademark Office: "High bandwidth time-and-space resolved scatter phase transition microscopy systems configured to detect melt onset in a wafer being processed by laser annealing systems with ultra-short dwell times and spot size."

The patent was filed on April 10, 2023, under Application No. 18/297,745.

*For further information, including images, char...