ALEXANDRIA, Va., June 19 -- United States Patent no. 12,331,998, issued on June 17, was assigned to VAST GLORY ELECTRONICS & HARDWARE & PLASTIC(HUI ZHOU) LTD. (Hui Zhou, China).
"Vapor chamber" was invented by Lei Lei Liu (Hui Zhou, China), Xiao Min Zhang (Hui Zhou, China) and Xue Mei Wang (Hui Zhou, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "This disclosure relates to a vapor chamber configured to accommodate a cooling fluid. The vapor chamber includes a first cover, a second cover, a first capillary structure, and a second capillary structure. The second cover and the first cover are attached to each other to form a chamber therebetween. The chamber is configured to accommodate the cooling fluid....