ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,513,981, issued on Dec. 30, was assigned to Vanguard International Semiconductor Corp. (Hsinchu, Taiwan).
"Semiconductor device" was invented by Wei-Chih Cheng (Tainan, Taiwan), Chia-Hao Lee (Hsinchu County, Taiwan) and Chih-Cherng Liao (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes a semiconductor channel layer and a semiconductor barrier layer disposed on a substrate. A passivation layer covers the semiconductor barrier layer. A first gate electrode and a second gate electrode are laterally separated from each other and at least partially disposed in the passivation layer respectively. Along a first dir...