ALEXANDRIA, Va., Aug. 6 -- United States Patent no. 12,382,645, issued on Aug. 5, was assigned to Vanguard International Semiconductor Corp. (Hsinchu, Taiwan).
"Semiconductor device" was invented by Syed-Sarwar Imam (Bihar, India), Chia-Hao Lee (Hsinchu County, Taiwan) and Hung-Wei Wang (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device, which comprises a semiconductor substrate, an epitaxial layer, first metal structures, first doped regions, second metal structures, second doped regions, a conductive layer and a Schottky layer. The epitaxial layer is disposed on the semiconductor substrate. The first metal structures are disposed in the epitaxial layer. The first metal s...