ALEXANDRIA, Va., June 18 -- United States Patent no. 12,327,664, issued on June 10, was assigned to VANAM INC. (Seoul, South Korea).
"Oxide thin film" was invented by Soo Deok Han (Seoul, South Korea) and Won Young Choi (Seoul, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present technology relates to an oxide thin film. The oxide thin film of the present technology may include a single crystal substrate; and a main oxide layer laminated on the single crystal substrate and doped with dissimilar metal elements, wherein in energy-dispersive X-ray spectroscopy (EDX) using a transmission electron microscope (TEM), the dissimilar metal elements and metal elements of a metal oxide constituting th...