US Patent Issued to Valea on Jan. 13 for "Method and apparatus for scatterer localization and material identification" (Swedish, Chinese, Indian Inventors)

ALEXANDRIA, Va., Jan. 13 -- United States Patent no. 12,523,746, issued on Jan. 13, was assigned to Valea AB (Stockholm).

"Method and apparatus for scatterer localization and material identification" was invented by Yi Geng (Nanjing Jiangsu, China), Vijaya Yajnanarayana (Bangalore, India), Deep Shrestha (Linkoping, Sweden), Ali Behravan (Stockholm) and Erik Dahlman (Stockholm).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the present disclosure provide methods and apparatus for scatterer localization and material identification. The method performed by an identification apparatus may comprise: determining (S101) a reflection loss of a power of a wireless signal caused by a reflection at an obj...