US Patent Issued to V TECHNOLOGY on Oct. 28 for "Metal pattern inspection method and focused ion beam apparatus" (Japanese Inventor)

ALEXANDRIA, Va., Oct. 28 -- United States Patent no. 12,456,599, issued on Oct. 28, was assigned to V TECHNOLOGY Co. LTD. (Kanagawa, Japan).

"Metal pattern inspection method and focused ion beam apparatus" was invented by Michinobu Mizumura (Yokohama, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A metal pattern inspection method which applies a pulsed voltage to a metallic pattern, sets a cycle of the pulsed voltage to be shorter than a scanning cycle in which a focused ion beam is swept, indicating only a region of a secondary charged particle image corresponding to a portion of the metallic pattern which is isolated by a wire breakage and to which the pulsed voltage is applied in the form of a firs...